Much of the research we do involves micro- and nano-fabrication of structures. We are heavy users of the University of Iowa MATfab facility. Our work on mid-ir optoelectronics requires fabrication of isolated micron-scale devices and arrays from epitaxially grown wafers using things like photolithography, dry and wet etching, and metal and dielectric deposition. Our work on plasmonics and metamaterials with nanoscale structures makes use of tools such as electron-beam lithography, as does our work on patterned substrates for nanowire growth.